Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
TOTAL REFLECTION FLUORESCENCE XAFS MEASURING APPARATUS
Document Type and Number:
Japanese Patent JP2004333131
Kind Code:
A
Abstract:

To make parallel X rays applied to a sample and to fully secure the X-ray intensity by irradiating the sample with dispersion X rays coming out of a light reception slit after condensation by a curved crystal monochromator after turning the dispersion X rays into parallel beams by a parabolic multilayer mirror.

The wavelength of the X rays 22 coming out of the light reception slit 14 can be changed by changing the relative position relationship among an X ray source 10, the light reception slit 14, and the curved crystal monochromator 12. The X rays 22 are reflected by the parabolic multilayer film mirror 24 to become parallel beams 26. The parallel beams 26 are transmitted through a transmission type X-ray detector 28 and enter the surface of the sample 30 under total reflection conditions. Fluorescent X rays 36 coming out of the sample 30 are detected by a fluorescent X-ray detector 38.


Inventors:
TAGUCHI TAKEYOSHI
Application Number:
JP2003124765A
Publication Date:
November 25, 2004
Filing Date:
April 30, 2003
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
RIGAKU DENKI CO LTD
International Classes:
G01N23/223; G21K1/06; (IPC1-7): G01N23/223; G21K1/06
Attorney, Agent or Firm:
Toshiyuki Suzuki