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Title:
TOTAL REFLECTION X-RAY SPECTROMETRIC APPARATUS OF ENERGY ANGLE DISPERSION TYPE
Document Type and Number:
Japanese Patent JPH0933451
Kind Code:
A
Abstract:

To highly accurately determine a structural parameter such as an interatomic distance or the like, by measuring a dependency of a reflectivity of X rays on energy with the use of a total reflection phenomenon of X rays.

A white X rays 12 generated from an X ray source 11 are shaped by a slit 13. After high energy X rays are removed by a total reflection mirror 14, the X rays are brought into a curved polychromatic crystal 15. X rays 16 an energy angle of which is dispersed at the crystal 15 are passed through a slit 17 for removing scattering X rays, and sent into a sample 18 fixed onto a sample stage 19 while being focused on the sample 18. An intensity of reflecting X rays 110 from the sample 18 after passing through a slit 111 is measured by a first dimensional detector 112. A sample chamber 113 and the detector 112 are movable on an apparatus stage in a horizontal direction or vertical direction of X ray beams. Accordingly, even a thin film sample formed on a substrate can be measured in a short time, and a structural parameter such as an interatomic distance or the like can be determined highly accurately.


Inventors:
TAMURA TAKUO
NAKANO ASAO
OGATA KIYOSHI
SUENAGA KAZUFUMI
Application Number:
JP18877595A
Publication Date:
February 07, 1997
Filing Date:
July 25, 1995
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
G01N23/06; G01N23/08; (IPC1-7): G01N23/06; G01N23/08
Attorney, Agent or Firm:
Ogawa Katsuo