Title:
テンプレートを有する転写リソグラフィシステムおよび基板とテンプレートを整列させる方法
Document Type and Number:
Japanese Patent JP4512167
Kind Code:
B2
Abstract:
A system for forming a pattern on a substrate using a patterned template comprising a support configured to hold the patterned template during use, a template adjustment device coupled to the support, wherein the template adjustment device is configured to alter the size of the template during use.
Inventors:
Choi, Byun Jin
Colburn, Matthew
Slievasan, S.V.
Bailey, Todd
Colburn, Matthew
Slievasan, S.V.
Bailey, Todd
Application Number:
JP2009297519A
Publication Date:
July 28, 2010
Filing Date:
December 28, 2009
Export Citation:
Assignee:
BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM
International Classes:
G02B5/18; H01L21/027; B29C35/08; B29C37/00; G03F7/00; G03F7/20
Domestic Patent References:
| JP2001085501A | ||||
| JP2000323461A | ||||
| JP2000309037A | ||||
| JP2001287200A | ||||
| JP2001277200A | ||||
| JP2001074921A | ||||
| JP2001068411A |
Foreign References:
| WO2001033300A1 | ||||
| WO2001050523A1 | ||||
| US20020150398 | ||||
| US4897228 | ||||
| US6051179 | ||||
| US6489068 |
Attorney, Agent or Firm:
Masaki Yamakawa
Shigeki Yamakawa
Shigeki Yamakawa