Title:
TRANSFER MASK AND ITS MANUFACTURE
Document Type and Number:
Japanese Patent JPS6236669
Kind Code:
A
Abstract:
PURPOSE: To obtain a low-cost mask small in dimensional strain and superior in strippability by attaching Al or an aluminum alloy on an insulating substrate, forming a desired pattern, and an alumina film pattern by chemical treatment.
CONSTITUTION: A circuit pattern of a thin Al film 3 is formed on a quartz plate 1, and on this surface an alumina film 4 is formed only by immersing the Al film 3 into pure boiled water at 100°C for 1min. Al is stronger in adhesion to the quartz plate 1 than Cr, and not peeled by friction or the like. The hardness of the alumina film 4 is higher than the quartz film and has strength high enough to endure friction.
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Inventors:
HARADA HIROTSUGU
IKEDA SHINGO
FURUTA ISAO
HARADA SHIGERU
NAKAMURA MITSUYOSHI
TAKAGI HIROSHI
IKEDA SHINGO
FURUTA ISAO
HARADA SHIGERU
NAKAMURA MITSUYOSHI
TAKAGI HIROSHI
Application Number:
JP17498385A
Publication Date:
February 17, 1987
Filing Date:
August 10, 1985
Export Citation:
Assignee:
MITSUBISHI ELECTRIC CORP
International Classes:
G03F1/00; G03F1/58; H01L21/027; (IPC1-7): G03F1/00; H01L21/30
Attorney, Agent or Firm:
Saburo Kimura (1 outside)