Title:
TRANSFER TYPE PHOTOSENSITIVE FILM, METHOD FOR FORMING PROTECTIVE FILM, AND FORCE SENSOR
Document Type and Number:
Japanese Patent JP2019066630
Kind Code:
A
Abstract:
To provide a transfer type photosensitive film, from which a protective film can be formed that has excellent acid durability and can suppress corrosion of an electrode containing a copper-nickel alloy by an acid, a method for forming a protective film using the same, and a force sensor.SOLUTION: The transfer type photosensitive film includes a support film and a photosensitive resin layer disposed on the support film and comprising a binder polymer, a photopolymerizable compound having an ethylenically unsaturated group and a photopolymerization initiator. The photosensitive resin layer contains at least one basic compound selected from the group consisting of a thiadiazole compound, a pyrazole compound, an imidazole compound, a triazole compound and a tetrazole compound, and the content of the basic compound in the photosensitive resin layer is 1.5 to 5 pts.mass with respect to total 100 pts.mass of the binder polymer and the photopolymerizable compound.SELECTED DRAWING: None
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Inventors:
ABE KOJI
AYUGASE TOMOHIRO
AYUGASE TOMOHIRO
Application Number:
JP2017191024A
Publication Date:
April 25, 2019
Filing Date:
September 29, 2017
Export Citation:
Assignee:
HITACHI CHEMICAL CO LTD
International Classes:
G03F7/004; B32B27/18; G03F7/033; G03F7/085; H01L41/113; H05K3/28
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshinori Shimizu
Hiroyuki Hirano
Yoshinori Shimizu
Hiroyuki Hirano