Title:
TRANSPARENT ANTIFOGGING MATERIAL
Document Type and Number:
Japanese Patent JPH0341402
Kind Code:
A
Abstract:
PURPOSE:To obtain the transparent antifogging material which simultaneously satisfies the improvement in an antifogging property and surface hardness by forming a porous layer of 3000Angstrom to 10mum thickness consisting of silicon oxide on a transparent synthetic resin base material on which a surface layer satisfying specific formula is provided. CONSTITUTION:The transparent synthetic resin base material 1 consists of the base material 10, such as transparent acrylic resin, and the surface layer 11 which is provided on the surface thereof and satisfies the formula I. In the formula, F is the value of the molar number (mumol/cm<2>) at which a basic dye can react or stick per unit area of the base material surface and Hv is the value of the Vickers hardness measured by a method complying with JIS-Z-2244. The thickness of the porous layer 3 consisting of the silicon oxide formed on this base material 1 is specified to 3000 deg. to 10mum thickness. The adhesive property of the porous layer 2 consisting of the silicon oxide is enhanced and the improvement in the antifogging property and the surface hardness is simultaneously attained if the compd. satisfying the formula I is used as the surface layer 11. In addition, the transparent antifogging material with which the high adhesive property is obtainable is obtd. without being affected by the kind of the resin material used as the base material.
Inventors:
UENISHI MICHIHARU
TAKEI MASATOSHI
MORITA MITSUHARU
KOBAYASHI YUKIO
TAKEI MASATOSHI
MORITA MITSUHARU
KOBAYASHI YUKIO
Application Number:
JP17640789A
Publication Date:
February 21, 1991
Filing Date:
July 07, 1989
Export Citation:
Assignee:
MITSUBISHI RAYON CO
International Classes:
G02B27/00; C23C14/08; G02B1/10; G02B1/14; (IPC1-7): C23C14/08; G02B1/10; G02B27/00
Next Patent: JPH0341403