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Title:
TRANSPARENT GAS BARRIER FILM
Document Type and Number:
Japanese Patent JP2016078372
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a transparent gas barrier film having transparency allowing contents to be confirmed in a see-through manner by visual observation and sufficient gas barrier properties to protect the contents.SOLUTION: In a transparent gas barrier film 10, an inorganic vapor deposition layer 2 is formed on at least one surface of a transparent film substrate 1. The substrate 1 has a light transmittance at a wavelength of 366 nm of 80% or more. When the light transmittance of the substrate at a wavelength of 366 nm is designated as 100%, the light transmittance transmitting the inorganic vapor deposition layer 2 and the substrate 1 after vapor deposition of an inorganic material at a wavelength of 366 nm is 80% or more, and the total light transmittance through the entire layer is 80% or more. The inorganic vapor deposition layer 2 is formed of one of a silicon oxide, a silicon nitride, a silicon oxynitride, and an aluminum oxide, and has a layer thickness of 50-3,000 Å.SELECTED DRAWING: Figure 1

Inventors:
HIZUME TOMOMI
UEDA KYOSUKE
Application Number:
JP2014213486A
Publication Date:
May 16, 2016
Filing Date:
October 20, 2014
Export Citation:
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Assignee:
TOPPAN PRINTING CO LTD
International Classes:
B32B9/00; C23C14/20
Domestic Patent References:
JP2000355070A2000-12-26
JP2006019239A2006-01-19
JP2014065198A2014-04-17
JP2014058154A2014-04-03
JP2012240222A2012-12-10
JP2010018302A2010-01-28
JP2010017903A2010-01-28
JP2007254663A2007-10-04
JPH10151696A1998-06-09
JP2008087182A2008-04-17
JP2001192809A2001-07-17
JPH10237397A1998-09-08
JPH1170611A1999-03-16
JPH0351122A1991-03-05
JP2006326899A2006-12-07
JP2008036948A2008-02-21
JP2007076314A2007-03-29
Foreign References:
WO2006030762A12006-03-23
WO2010093041A12010-08-19



 
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