Title:
TREATING DEVICE AND TREATMENT OF SUBSTRATE SURFACE
Document Type and Number:
Japanese Patent JP2699229
Kind Code:
B2
Abstract:
PURPOSE: To improve the finish of substrate surfaces and to increase a treating capacity by forming zigzag flow passages between the substrates and a treating tank so as to increase the flow velocity of a treating liquid.
CONSTITUTION: There is a spacing 22 through which fluid can pass in a 1st supporting body 18 which supports the substrate 11a within the treating tank 10. This spacing does not exist in a 2nd supporting body 19 which supports the next substrate 11b and comes into close contact with the treating tank 10. The flow passage for the fluid 14 from a treating liquid supply port to a discharge port 12 while meandering between the plural substrates 11a and 11b is formed.
More Like This:
| JPWO2017037757 | Surface treatment equipment |
| JPH0448086 | ETCHING AND DEVELOPING METHOD |
| JPH08269743 | FILM RELEASING DEVICE |
Inventors:
Yoshifumi Kishida
Hashimoto Mikio
Hashimoto Mikio
Application Number:
JP28306591A
Publication Date:
January 19, 1998
Filing Date:
October 29, 1991
Export Citation:
Assignee:
Sharp Corporation
International Classes:
C23F1/08; C25F7/00; H05K3/06; (IPC1-7): C23F1/08; C25F7/00; H05K3/06
Attorney, Agent or Firm:
Nakamura Tsunehisa
Previous Patent: PANEL FOR BUILDING
Next Patent: ANTIRADIATION OPTICAL FIBER, IMAGE FIBER AND PRODUCTION THEREFOR
Next Patent: ANTIRADIATION OPTICAL FIBER, IMAGE FIBER AND PRODUCTION THEREFOR