TREATMENT APPARATUS AND TREATMENT METHOD - Dainippon Screen Mfg. Co., Ltd.

Title:

TREATMENT APPARATUS AND TREATMENT METHOD

Document Type and Number:

Japanese Patent JP3966809

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a treatment apparatus and treatment method which unifies the treatment time on a front surface of substrates and never causes an unevenness in development.
SOLUTION: Moving in a second direction Y, a slit nozzle 224 discharges a developing solution on the substrate 100. Then, the substrate 100 is transferred from a liquid placement 200 to a tilting section 300 along a first direction X. After the substrate 100 is transferred to the tilting section 300, the tilting section 300 is tilted around the axis parallel to the first direction X, so that one side of the substrate 100 may be higher than the other side, to let the developing solution on the substrate 100 run off as the tilting section 300 inclines.

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Inventors:

Koji Toyoda
Mitsuaki Yoshitani

Application Number:

JP2002358517A

Publication Date:

August 29, 2007

Filing Date:

December 10, 2002

Export Citation:

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Assignee:

Dainippon Screen Mfg. Co., Ltd.

International Classes:

G02F1/13; H01L21/027; G03D3/08; G03F7/30; (IPC1-7): H01L21/027; G03F7/30; //G02F1/13

Domestic Patent References:

JP2003007582A
JP2003059824A
JP2003037034A
JP2002338041A
JP8044075A
JP8017723A
JP11087210A
JP2001046941A

Attorney, Agent or Firm:

Yoshito Fukushima

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