TREATMENT OF EXHAUST GAS CONTAINING HALOGEN AND HALOGEN COMPOUND

Title:

TREATMENT OF EXHAUST GAS CONTAINING HALOGEN AND HALOGEN COMPOUND

Document Type and Number:

Japanese Patent JPH0647233

Kind Code:

A

Abstract:

PURPOSE: To provide a treating method which enables effectively removing halogens and halogen compounds in an exhaust gas from the dry etching stage in the semiconductor manufacturing process.

CONSTITUTION: A container of 400mm diameter made of acrylic resin is packed with a silicate having 7 to 16 mesh particle size and 9 average pore diameter, up to the 50mm height. Then, N2 gas contg. SiF4, F2, HCl, Cl2, HBr, Br2 and CCl4, in 1% concentration each, is supplied through the silicate at the rate of 0.3 liter/min. Each of the above halogen and halogen compound gases breaks through the silicate when the gas volume fed per 1 liter of the silicate amounts to 19, 60, 47, 20, 53, 31 and 12 liters, respectively. Therefore, a zeolite having 9 average pore diameter is capable of adsorbing halogen and halogen compound gases without exception.

Inventors:

FUKUNAGA AKIRA
MORI YOICHI
KYOTANI TAKASHI

Application Number:

JP17373992A

Publication Date:

February 22, 1994

Filing Date:

June 09, 1992

Export Citation:

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Assignee:

EBARA INFILCO
EBARA RES CO LTD
EBARA CORP

International Classes:

B01D53/02; B01D53/34; B01D53/68; B01J20/18; (IPC1-7): B01D53/02; B01D53/34; B01J20/18

Domestic Patent References:

JPS61153190A	1986-07-11
JPS63291624A	1988-11-29

Attorney, Agent or Firm:

Katsura Yoshimine (1 person outside)

Next Patent: 粉粒体供給装置