Title:
TREATMENT OF WASTE GAS AND DEVICE THEREFOR
Document Type and Number:
Japanese Patent JP2749258
Kind Code:
B2
Abstract:
PURPOSE: To provide a method for treating waste gas and a device therefor in which a noxious material is effectively and at low cost removed or made harmless and the life of waste gas equipment is prolonged by a method using simple equipment.
CONSTITUTION: Water (reduced water) whose ORP has been lowered by applying voltage is sprayed into waste gas, or the waste gas is passed through the reduced water housed in a screen tank dividing a waste gas duct, allowing a noxious material in the waste gas to be removed or made harmless. In order to perform this method, a water treating device (a reducing device) 4 for producing the reduced water fed to a spray nozzle 5 for spraying into the waste gas or to the screen tank is used. The reducing device is equipped with an applying electrode 6 forming a pair with an earth electrode, a DC power source, the 1st and 2nd high frequency switches, a high frequency switching command circuit, and a high frequency oscillator.
Inventors:
HAYAKAWA HIDEO
Application Number:
JP3456394A
Publication Date:
May 13, 1998
Filing Date:
March 04, 1994
Export Citation:
Assignee:
HAYAKAWA HIDEO
International Classes:
B01D53/34; B01D53/18; B01D53/32; B01D53/40; B01D53/50; B01D53/56; B01D53/68; B01D53/77; C02F1/46; C02F1/461; (IPC1-7): B01D53/34; B01D53/18; B01D53/32; B01D53/50; B01D53/56; B01D53/68; B01D53/77; C02F1/46
Domestic Patent References:
| JP6218226A | ||||
| JP6218222A | ||||
| JP5111690A | ||||
| JP4367782A | ||||
| JP4225892A | ||||
| JP62501691A |
Other References:
【文献】特許2615308(JP,B2)
【文献】特許2611080(JP,B2)
【文献】特許2611080(JP,B2)
Attorney, Agent or Firm:
Isao Sasaki (1 person outside)