To obtain a triblock oligomer manifesting anti-fogging effects right after molding, stable anti-fogging properties for long time when used in a resin composition.
The triblock oligomer has the structure of formula A-B-C [A is R1-X{R1 is an alkyl, an alkenyl, etc., X is O, OC(=O), etc.}; B is expressed by formula I (R2, R3 are each an alkylene; m is 1 to 30; n is 0 to 29 and m+n ≤30); C is -R4-Y-R5{R4 is an alkylene; Y is O, OC(=O), etc.; R5 is H, an alkyl, etc.}], having weight average molecular weight of 100-8000 measured by gel- permeation chromatography, and obtained, for example, from montanic acid wax, polyoxyethylene lauryl ether, and methane sulfonic acid. This oligomer is obtained by carrying out a reaction of a higher aliphatic acid of 10 to 40C or a polyolefin containing carboxylic acid groups and a polyoxyalkylene compound of formula II (Z is OH, NH2), or a polyoxyalkylene compound of formula III.
FUKUTANI KENZABURO
OE TATSUYA
KURISU MASAYOSHI
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