PURPOSE: To easily enable the ultra-microfabrication of a nanometer level by positioning a micro-tunnelling probe opposite to the surface of a substrate in a solution and performing electrolytic deposition or anodic dissolution on the substrate.
CONSTITUTION: In a tunnelling electron microscope system, an ultra-microlocal electrolytic deposition is performed on a specimen of the substrate in an aq. solution contg. 1M CuSO4 and 0.6% H2SO4 at room temp. by using a micro- tunnelling probe which is made of a tungsten needle and the surface of which except the needle tip is coated with an insulating material and by using pure gold as the electrode to effect the electrolytic deposition and a tunnelling electrode. This electrolytic deposition can be applied to metals which are ionizable in their aq. solutions, such as Au, Cr or other materials to be ionizable. Also, metals such as Cu, etc., can be subjected to local, and anodic dissolution by using micro-tunnelling current and this anodic dissolution by using the micro- tunnelling current can also be applied to other materials such as metals which are ionizable in their aq. solutions. Thus, the specimen of the substrate can be subjected to the micro-fabrication of nanometer level.
| JP5816577 | Continuous partial surface treatment equipment |
| WO/2023/286692 | SEMICONDUCTOR WAFER |
NAGASHIMA NOBUO
MATSUOKA SABURO
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