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Title:
ULTRA PURE WATER PRODUCTION AND WASTEWATER TREATMENT IN CLOSED SYSTEM
Document Type and Number:
Japanese Patent JP3194123
Kind Code:
B2
Abstract:

PURPOSE: To simplify the processes of a closed system by concentrating high concentration wastewater in wastewater after use of ultrapure water by an evaporating apparatus for concentration and effective for multiple purposes and an evaporating apparatus for high concentration and effective for multiple purposes and supplying the recovered distilled water therefrom respectively to a primary pure water producing apparatus and to a cooling apparatus.
CONSTITUTION: Water for industrial use is made as ultrapure water by a reverse osmosis membrane treatment apparatus (reverse osmosis apparatus) 1, an evaporating apparatus effective for multiple purposes (multipurpose apparatus) 2, an apparatus 3 to produce secondary pure water at a normal temperature and an apparatus 4 to produce ultrapure water at a high temperature, and the ultrapure water is supplied to a use point 5. At the use point 5, concentrated water of the reverse osmosis apparatus 1 is joined to wasterwater with high concentration after use and the resultant water is supplied to an evaporating apparatus 8 for concentration and effective for multiple purposes after passing a heat-exchanger 6, a distillation tower 7, and a heat-exchanger 6. At that time, the concentrated water C' of the multipurpose apparatus 2 is added and supplied to the concentrated water. Meanwhile, at the use point 5, an aqueous sodium hydroxide solution is added to diluted wastewater (4) after use and recovered as recovered water 5' after passing a heat-exchanger 11, a stripping tower 10, and a heat-exchanger 11, and then supplied between the reverse osmosis apparatus 1 and the multipurpose apparatus 2.


Inventors:
Shiro Inoue
Hidetaka Sawada
Shoichi Momose
Takashi Hirano
Tadahiro Moriyama
Application Number:
JP3050895A
Publication Date:
July 30, 2001
Filing Date:
February 20, 1995
Export Citation:
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Assignee:
Hitachi Zosen Corporation
International Classes:
B01D61/02; B01D1/26; B01D53/86; C02F1/04; C02F1/20; C02F1/44; C02F1/66; (IPC1-7): C02F1/04; B01D1/26; B01D53/86; B01D61/02; C02F1/20; C02F1/44; C02F1/66
Domestic Patent References:
JP679257A
JP7227592A
JP380982A
Attorney, Agent or Firm:
Eisuke Kishimoto (3 others)