Title:
高分子の超薄膜加工法
Document Type and Number:
Japanese Patent JP3816803
Kind Code:
B2
Abstract:
In a method for preparing ultra-thin films of carbon-containing materials, particularly thin films of polymer materials. Films with a thickness of 0.5 mum or less are formed by deposition of the materials from a liquid phase onto a solid surface. The deposition takes place in an enclosure where the materials also are subjected to a post-deposition processing. The total humidity content in the enclosure shall be maintained at a level corresponding to a relative humidity of less than 50% in a volume of air equal to the volume of enclosure by excluding and/or removing water arid water vapor from the materials and/or the atmosphere in the enclosure.
Inventors:
Nordal, Peru-Erik
Johansson, Niclas
Johansson, Niclas
Application Number:
JP2001563295A
Publication Date:
August 30, 2006
Filing Date:
February 06, 2001
Export Citation:
Assignee:
Thin film electronics
International Classes:
B05D5/12; B05D3/12; B29C41/08; B29C41/50; B29D7/01; C08J5/18; H01L21/8242; H01L27/108
Domestic Patent References:
| JP5229065A | ||||
| JP2307566A | ||||
| JP8008170A | ||||
| JP8236436A | ||||
| JP9205062A | ||||
| JP6021392A |
Attorney, Agent or Firm:
Hideto Asamura
Hajime Asamura
Katsunori Ando
Yukihiro Ikeda
Hajime Asamura
Katsunori Ando
Yukihiro Ikeda
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