To provide an ultrasonic treatment apparatus that can uniformly clean a substrate by treatment liquid where ultrasonic vibration is applied.

The ultrasonic treatment apparatus for treating a substrate by treatment liquid where ultrasonic vibration is applied while rotating the substrate has a rotating table 3 for removably retaining the substrate W, a control motor 11 for rotating and driving the rotating table, a nozzle body 29 that is subjected to reciprocative drive along the diameter direction of the substrate and at the same time jets cleaning liquid where the ultrasonic vibration is applied toward the substrate, an ultrasonic oscillator that modulates the ultrasonic vibration to a waveform where strength varies by a specific frequency for adding to the cleaning liquid jetted from the nozzle body, and a control apparatus 14 for controlling the control motor to rotate the rotating table by speed that is not synchronized with the modulation frequency of the ultrasonic vibration generated by the ultrasonic oscillator.