PURPOSE: To provide an array tube ultrasonic wave probe and its manufacture with high reliability in which no exfoliation between a piezoelectric film and an electrode is not caused with a high mechanical strength and no short-circuit between electrodes takes place.
CONSTITUTION: An SiO2 oxide film 11 is formed on the surface of a substrate 10. Then the etching of the oxide film 11 and the substrate 11 is implemented by using a resist pattern 12 formed by the photo lithography technology as a mask to form plural array shaped grooves 13. Then the undesired resist pattern 12 is removed by an organic solvent. Moreover, a lower electrode 14 and a piezoelectric film 15 are vapor-depositted and the film is formed respectively by the sputter method respectively. Then the oxide film 11 is removed by a solution, the undesired lower electrode 14 and piezoelectric film 15 depositted to the part other than the grooves 13 are removed with the oxide film 11 by the lift-off method. Finally a common upper electrode 16 is coated on them by the mask vapor-deposition method.
Hashimoto Hisagi
Shunsuke Shimakura
Tamura Morio
