Title:
多層レジストプロセス用下層膜形成組成物
Document Type and Number:
Japanese Patent JP4729803
Kind Code:
B2
Inventors:
Kazuo Kawaguchi
Masato Tanaka
Tsutomu Shimokawa
Masato Tanaka
Tsutomu Shimokawa
Application Number:
JP2001097348A
Publication Date:
July 20, 2011
Filing Date:
March 29, 2001
Export Citation:
Assignee:
JSR CORPORATION
International Classes:
G03F7/11; C08F32/08; C08F299/02; C08G10/00; C08K5/00; C08L45/00; C08L61/18; H01L21/027
Domestic Patent References:
| JP2000143937A | ||||
| JP3852107B2 | ||||
| JP2001027810A | ||||
| JP2001040293A | ||||
| JP2022657A |
Attorney, Agent or Firm:
Toshiaki Fukuzawa