PURPOSE: To prevent the clouding of an incident window and to make stable and uniform film formation by growing a thin film on the surface of a substrate by introduction of electromagnetic waves into a reaction chamber and excitation of gaseous raw materials and heating the incident window for the electromagnetic waves, then depositing the good-quality film on the window.
CONSTITUTION: Light 12 from a light source 6 is projected through the incident window 7 to molecules 13 of the gaseous raw materials supplied from a nozzle 5 in the chamber 1. The molecules 13 excited by this light 12 reacts and grows the thin film of a single element or compd. on the surface of the substrate 4 heated to a prescribed temp. by a heater 3 via a substrate holder 2. The above-mentioned incident window 7 and an exit window 8 facing the same are heated to a prescribed temp. by temp. controllers 10, 11 to deposit the transparent good-quality films on the surfaces thereof in the above-mentioned photo-CVD method. The intensity of the light to be projected is maintained constant by controlling a light source 6 with a power meter 9 and a projection intensity controller 13, by which the uniform film formation is executed.
SAITO KAZUICHI
KAJI RYUICHI
ARASHI NORIO
