Title:
不飽和単量体、重合体、化学増幅レジスト組成物、および、パターン形成方法
Document Type and Number:
Japanese Patent JP4139948
Kind Code:
B2
Abstract:
There is provided a chemically-amplified resist composition having high transparency to light having a wavelength of 220 nanometers or smaller, excellent resistance to etching, and excellent adhesion to a substrate. The chemically-amplified resist composition is prepared through the use of at least one of a repeated structural unit having a bridged alicyclic gamma-lactone structure defined in the general formula (III), a repeated structural unit having a bridged alicyclic gamma-lactone structure defined in the general formula (IV), and a repeated structural unit having a bridged alicyclic gamma-lactone structure defined in the general formula (V).
Inventors:
Katsumi Maeda
Kaichiro Nakano
Kaichiro Nakano
Application Number:
JP2002190827A
Publication Date:
August 27, 2008
Filing Date:
June 28, 2002
Export Citation:
Assignee:
NEC
International Classes:
C08F20/28; C07D307/92; C07D307/93; C07D493/22; C08F32/08; C08G61/08; C08G61/12; G03F7/039; H01L21/027
Domestic Patent References:
| JP2002371114A | ||||
| JP2002308866A | ||||
| JP2001242627A |
Foreign References:
| WO2002048217A1 |
Attorney, Agent or Firm:
Akio Miyazaki
Masaaki Ogata
Ishibashi Masayuki
Masaaki Ogata
Ishibashi Masayuki