Title:
掻痒の処置のためのＧＡＢＡＡ受容体モジュレーターの使用
Document Type and Number:
Japanese Patent JP7115746
Kind Code:
B2
Abstract:
A compound for use in the treatment of itch is provided, wherein the compound comprises the general formula (1a), general formula (1b) or general formula (1c). The compounds of the invention are positive allosteric α2 and/or α3 GABAA receptor modulators.
Inventors:
Hans Ulrich, Zeilhofer
Larvenius, William
Larvenius, William
Application Number:
JP2018539149A
Publication Date:
August 09, 2022
Filing Date:
January 27, 2017
Export Citation:
Assignee:
Universitate Zurich
International Classes:
A61K31/437; A61K31/5025; A61K31/53; A61P17/04; A61P43/00
Domestic Patent References:
| JP2001514206A | ||||
| JP2002514169A |
Foreign References:
| WO2006061428A2 | ||||
| US20130331394 |
Other References:
CHEN LONG,JOURNAL OF PAIN,2015年11月11日,VOL:17, NR:2,PAGE(S):181 - 189
DE LUCAS A GARCIA,BIOCHEMICAL PHARMACOLOGY,2014年12月25日,VOL:93, NR:3,PAGE(S):370 - 379
KOHUT S J,PHARMACOLOGY BIOCHEMISTRY AND BEHAVIOR,2008年,VOL:90, NR:1,PAGE(S):65 - 73
DE LUCAS A GARCIA,BIOCHEMICAL PHARMACOLOGY,2014年12月25日,VOL:93, NR:3,PAGE(S):370 - 379
KOHUT S J,PHARMACOLOGY BIOCHEMISTRY AND BEHAVIOR,2008年,VOL:90, NR:1,PAGE(S):65 - 73
Attorney, Agent or Firm:
Osamu Yamamoto
Toru Miyamae
Junichi Matsuo
Takuji Terachi
Toru Miyamae
Junichi Matsuo
Takuji Terachi
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