USE OF TOP LAYER OF MIRROR USED IN LITHOGRAPHY APPARATUS, MIRROR FOR USE IN LITHOGRAPHY APPARATUS, LITHOGRAPHY APPARATUS EQUIPPED WITH SUCH MIRROR, AND METHOD OF MANUFACTURING THE DEVICE

Japanese Patent JP2005129936

A

To provide a use of a top layer 8 of predetermined metal on a mirror used in lithography apparatus, a mirror for use in lithography apparatus, and a lithography apparatus having such a mirror or a mirror equipped with a top layer for use in lithography apparatus.

The apparatus has a radiation source SO which provides a radiation of desired wavelength such as EUV. The radiation source SO generates a stream of undesired metallic particles that are deposited on a mirror, forming relatively small and large nuclei thereon. The metal of the top layer 8 and the nuclei of the deposited metal may interdiffuse in a predetermined range of the temperature. As a result, an alloy layer 14 consisting of these metallic particles and the metal of the top layer 8 is formed additionally on the top layer 8. The reflectivity of the additional alloy layer is higher than that of a layer comprising solely the metallic particles.

BAKKER LEVINUS PIETER
SCHUURMANS FRANK JEROEN PIETER

JP2004304405A

May 19, 2005

October 19, 2004

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ASML NETHERLANDS BV

G02B1/00; G02B1/10; G02B5/08; G03F7/20; G21K1/06; G21K5/00; H01L21/00; H01L21/027; G03F1/24; (IPC1-7): H01L21/027; G02B5/08; G21K1/06; G21K5/00

JP2001523007A	2001-11-20
JP2003142296A	2003-05-16
JP2002319537A	2002-10-31
JP2003516643A	2003-05-13
JPH08236292A	1996-09-13
JP2005522839A	2005-07-28

WO2003087867A2	2003-10-23
EP1348984A1	2003-10-01
WO1999063790A1	1999-12-09

Hideto Asamura
Hajime Asamura
Toru Mori
Yukio Iwamoto

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