Title:
VACUUM DEVICE AND ABATEMENT SYSTEM
Document Type and Number:
Japanese Patent JP2006332339
Kind Code:
A
Abstract:
To provide a vacuum device and an abatement system which can reduce a cost for abatement.
In a vacuum device 1, a process for processing a work by supplying reaction gas into a treatment bath 10 which is evacuated by a vacuum pump 11, and a process for cleaning the work by supplying cleaning gas into the treatment bath 10, are executed alternately. The device is provided with first and second supply paths 14, 15 for supplying dilution gas for diluting the reaction gas to the vacuum pump 11 in the processing process, and a dilution gas supply valve 14a of the first supply path 14 is closed in the cleaning process, thus making a supply amount of dilution gas less than in the processing process.
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Inventors:
KIMURA KENTARO
Application Number:
JP2005153993A
Publication Date:
December 07, 2006
Filing Date:
May 26, 2005
Export Citation:
Assignee:
SHARP KK
International Classes:
H01L21/205; B01J3/00; B01J3/02; C23C16/44; H01L21/3065
Domestic Patent References:
| JPH11172440A | 1999-06-29 |
Attorney, Agent or Firm:
Shizuo Sano
Shigeki Yamada
Shigeki Yamada