Title:
VACUUM EVAPORATION SYSTEM AND METHOD OF ITS USE
Document Type and Number:
Japanese Patent JPH10158814
Kind Code:
A
Abstract:
To provide a vacuum evaporation system which is capable of rapidly and easily removing the stains of an org. system sticking to the inside walls of the system and in which a sufficiently high vacuum state is maintained.
This vacuum evaporation system 1 has a vacuum chamber 2 and both side parts of the vacuum chamber 2 are provided with a gas introducing system 3 and a gas discharge system 4. A circular substrate holder 8 is freely rotatably installed above a sputtering vapor deposition source 5. A substrate to be formed with thin films is mounted at the substrate holder 8. A thin film 10 of a metal oxide having a photocatalyst effect is formed over the entire surface of the inside wall of the vacuum chamber 2.
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Inventors:
TAKESHITA YUKITOSHI
NISHI SHIRO
SASAKI SHIGEKUNI
TSURUMI SHIGEYUKI
TAKESHIMA MIKIO
TSURU SHINJI
YAMAMOTO FUMIO
NISHI SHIRO
SASAKI SHIGEKUNI
TSURUMI SHIGEYUKI
TAKESHIMA MIKIO
TSURU SHINJI
YAMAMOTO FUMIO
Application Number:
JP32404396A
Publication Date:
June 16, 1998
Filing Date:
December 04, 1996
Export Citation:
Assignee:
NIPPON TELEGRAPH & TELEPHONE
International Classes:
C23C14/00; (IPC1-7): C23C14/00
Attorney, Agent or Firm:
Masaki Yamakawa