To provide a vacuum film forming system which is capable of executing, as a series of processes, the processes from pretreatment such as cleaning of a work to completion of film forming by a vacuum film forming device.
This vacuum film forming system is constituted of a cleaning means 2, an activating means 3 and a vacuum film forming device 4. A thin film is formed on a work 7 by the vacuum film forming device 4, and then cleaning by the cleaning means 2 and activating treatment by the activating means 3 are carried out as the pretreatment. The cleaning means 2 is able to clean the work 7 in the dry state within a cleaning vessel 2a which is a closed space. The activating means 3 can activate the work 7 in an activating vessel 3a which is a closed space. The work 7 cleaned by the cleaning means 2 is transported through the closed space in 11, capable of keeping the work 7 in the dried state and placed in the activating means 3, and the work 7 activated by the activating means 3 is transported through a closed space in 12, capable of being made a vacuum atmosphere and placed in the vacuum film forming device 4.
TOKOMOTO ISAO
KOIZUMI YASUHIRO
YAMAGUCHI ASAKO
TAKIGAWA SHIRO
