Title:
VACUUM PROCESSING DEVICE AND EXHAUST RING
Document Type and Number:
Japanese Patent JP3833173
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a vacuum processing device which makes the conductance of an exhaust ring and exhaust efficiency to be enhanced, and to provide the exhaust ring.
SOLUTION: The annular exhaust ring 13 is disposed around a stand 2 for placing a semiconductor wafer W. The exhaust ring 13 is provided with plural kinds of exhaustion holes 14a, 14b, 14c, each having a different opening area from the others. These exhaustion holes 14a, 14b, 14c are arrayed so as to have a larger opening area in the order of the exhaust hole 14a arranged on the inner side, the exhaustion hole 14b arranged in the intermediate section and the exhaustion hole 14c arranged outermost periphery of the exhaust ring 13, i.e. they are arrayed so that the farther outside it is the exhaustion hole gradually has a larger opening area (diameter of the hole) than that of the adjacent inner exhaustion hole.
Inventors:
Kazuyuki Tezuka
Takashi Kitazawa
Akikura Norihiko
Hiroshi Koizumi
Takashi Kitazawa
Akikura Norihiko
Hiroshi Koizumi
Application Number:
JP2002368012A
Publication Date:
October 11, 2006
Filing Date:
December 19, 2002
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/3065; H01L21/31; (IPC1-7): H01L21/3065; H01L21/31
Domestic Patent References:
| JP7263351A | ||||
| JP6298727A | ||||
| JP2003174020A |
Attorney, Agent or Firm:
Saichi Suyama
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