Title:
真空処理装置
Document Type and Number:
Japanese Patent JP7240956
Kind Code:
B2
Abstract:
To provide a vacuum treatment apparatus having a good maintainability, the vacuum treatment apparatus being capable of suppressing wasteful consumption of a treatment gas in a case where a vacuum treatment is performed by introducing a treatment gas.SOLUTION: A vacuum treatment apparatus DM according to the invention includes a vacuum chamber 1 and substrate transfer means for transferring a sheet-like substrate Sw, and has a treatment space Ps in which a pair of guide rollers 5a, 5b are arranged in the vacuum chamber and a vacuum treatment is possible for a portion of the sheet-like substrate transferred between both guide rollers. The treatment space is defined by a pair of left and right roller plates 61a, 61b, a frame body 62 arranged at the front edge sides of the roller plates, a pair of upper and lower roller casings 63a, 63b which are respectively arranged along an upper frame part 62a and a lower frame part 62b of the frame body and have slit holes 633, and a base plate 64 on which a treatment unit Pu is arranged. The frame body is arranged proximately to a wall part 11 of the vacuum chamber facing the frame body and the wall part is openably/closably formed.SELECTED DRAWING: Figure 2
Inventors:
Shuji Saito
Application Number:
JP2019101481A
Publication Date:
March 16, 2023
Filing Date:
May 30, 2019
Export Citation:
Assignee:
ULVAC, Inc.
International Classes:
C23C14/56; C23C14/02; C23C16/02; C23C16/54
Domestic Patent References:
| JP200173133A | ||||
| JP2006104494A | ||||
| JP200327234A | ||||
| JP8244123A | ||||
| JP2015206576A |
Foreign References:
| US20050011747 |
Attorney, Agent or Firm:
Seika Patent Attorney Corporation
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