VACUUM TREATMENT APPARATUS

Japanese Patent JP2017057485

A

PROBLEM TO BE SOLVED: To provide a vacuum treatment apparatus having a mask material running unit constituted to be easily mounted and de-mounted.SOLUTION: A vacuum treatment apparatus comprises: guide means 8a and 8b for causing a portion Sm1 of a sheet-shaped mask material Sm to run in parallel with a sheet-shaped base material portion Sw1 by setting the direction, in which a sheet-shaped base material Sw is caused to run, as an X-axis direction and a width direction as a Y-axis direction; drive means 8c and 8d for causing the sheet-shaped mask material, while applying a predetermined tension, to run in synchronism with the sheet-like base material; and a support medium Ms for supporting the guide means and the drive means. The support medium has a frame work 6 having assembled the frame material, and, at the portion of the lower framework 6b positioned on one side of the Y-axis direction, a plurality of columns 65 are protruded downward at an interval in the X-axis direction. The substrate is so disposed in the vacuum chamber 1a through the columns that the portion of the sheet-shaped substrate and the lower sheet-shaped mask material portion of a sheet shape are parallel.SELECTED DRAWING: Figure 1

TAKAHASHI MAKOTO
SHIMIZU TAKESHI
NAKAO HIROTOSHI
SATO SEIICHI
SAKAUCHI YUYA

JP2015185914A

March 23, 2017

September 18, 2015

Click for automatic bibliography generation  

ULVAC CORP

C23C14/04; C23C14/56

JP2002235166A	2002-08-23
JP2011225932A	2011-11-10
JP2000313951A	2000-11-14
JPH09195048A	1997-07-29
JPS60155667A	1985-08-15

US20140315343A1	2014-10-23
CN102465252A	2012-05-23

Seiryu Corporation

Previous Patent: スナック及びその製造方法

Next Patent: A manufacturing method of a substrate for power modules with plating