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Title:
VACUUM PUMPING DEVICE
Document Type and Number:
Japanese Patent JP2005207419
Kind Code:
A
Abstract:

To provide a vacuum pumping device capable of being performed at a low initial cost, and a low maintenance cost and space requirement.

The vacuum pumping device and method are used for controlling pressure of a plurality of vacuum processing chambers, performing evacuation and providing relaxation. This system can be used in manufacturing a semiconductor. Gas in the plurality of vacuum processing chambers is discharged to a common relaxation chamber by a turbo pump, and the relaxation chamber is kept at a pressure lower than the atmospheric pressure by a backing pump. The pressure in the processing chambers are individually controlled. The internal capacity of a relaxation device forms a buffer for reducing the influence of the pressure change in one processing chamber on the pressure in another chamber.


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Inventors:
BAYLEY CHRISTOPHER M
BOGER MICHAEL S
Application Number:
JP2004380891A
Publication Date:
August 04, 2005
Filing Date:
December 28, 2004
Export Citation:
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Assignee:
BOC GROUP INC
International Classes:
F04B37/16; F04D19/04; F04D25/00; F04D25/16; H01L21/02; (IPC1-7): F04B37/16
Domestic Patent References:
JPH01159475A1989-06-22
JPH10266962A1998-10-06
JPH11319485A1999-11-24
JP2003117344A2003-04-22
JPS56146083A1981-11-13
JP2003139055A2003-05-14
JP2002508103A2002-03-12
Foreign References:
US4725204A1988-02-16
Attorney, Agent or Firm:
Kazuo Shamoto
Tadashi Masui
Yasushi Kobayashi
Akio Chiba
Hiroyuki Tomita
Hiroyuki Uchida



 
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