Title:
液浸フォトリソグラフィのための真空システム
Document Type and Number:
Japanese Patent JP4772787
Kind Code:
B2
Abstract:
A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.
Inventors:
Harpam Andrew John
Schecter Paul John
Stockman Paul Alan
Schecter Paul John
Stockman Paul Alan
Application Number:
JP2007516020A
Publication Date:
September 14, 2011
Filing Date:
June 06, 2005
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
H01L21/027; B01D57/00; G03F7/20
Domestic Patent References:
| JP2005005713A | 2005-01-06 | |||
| JP2005057278A | 2005-03-03 | |||
| JP2005223315A | 2005-08-18 | |||
| JP2006060223A | 2006-03-02 | |||
| JP2006165500A | 2006-06-22 | |||
| JP2005191344A | 2005-07-14 |
Foreign References:
| WO2005122221A1 | 2005-12-22 | |||
| US20040069330A1 | 2004-04-15 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Toshifumi Onuki