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Patent Searching and Data


Title:
VALVE FOR PHOTOSENSITIVE MATERIAL PROCESSING DEVICE
Document Type and Number:
Japanese Patent JP2002049138
Kind Code:
A
Abstract:

To provide a valve for a photosensitive material processing device which is capable of preventing the occurrence of liquid leakage and preventing the erroneous insertion of a filter when the valve is operated to a supply state of supplying prescribed liquid containing water into a processing vessel by a pump, etc., and a non-supply state for attaching and detaching the filter for filtering foreign matter.

This valve has a main body 33 which has a chamber 34 communicated with an introducing port member 36 connected to a water tank and a discharge port member 38 connected to a bellows pump, a valve member 42 which has a through-hole 43 for putting the valve into the supply state and is disposed in a liquid tight state by packings 40 and 41 in the chamber 34 and is moved in parallel to the positions of the supply state and the non-supply state, and the filter 50 which is made attachable and detachable into and from the through-hole 43 while the erroneous insertion is prevented.


Inventors:
OIKAWA YOSHINORI
Application Number:
JP2000236068A
Publication Date:
February 15, 2002
Filing Date:
August 03, 2000
Export Citation:
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Assignee:
NIDEC COPAL CORP
International Classes:
G03D3/06; (IPC1-7): G03D3/06
Attorney, Agent or Firm:
Yasunori Otsuka (2 outside)