To provide a compact vapor depositing device for a cathode-ray tube, easily treatable, applicable in a wide range from small production to mass production, good in a yield and high in reliability and to provide a continuous type vapor depositing device for a cathode-ray tube.

This vapor depositing device for a cathode-ray tube is composed of a chamber 1 having an opening sealed in such a manner that, to the upper part, the front face of a cathode-ray tube B is inserted to face downward, a means of evacuating the inside of the chamber, an evaporating source 5 arranged at the lower part in the chamber and evaporating a film forming material and an power source device 10 applying voltage into the chamber, and a film forming material evaporated in the vacuum is adhered to the surface of a cathode-ray tube B. Furthermore, the continuous type vapor depositing device for a cathode-ray tube is provided with plural moving stands arranged moveably along a prescribed path, and at least one vapor depositing device for a cathode-ray tube is placed on each moving stand.