Title:
VAPOR DEPOSITION MASK AND ITS PRODUCTION
Document Type and Number:
Japanese Patent JPS5375858
Kind Code:
A
Abstract:
PURPOSE:To obtain a vapor deposition mask capable of forming a film of less surface dulling at the specific portions of a wafer without using etching process by forming a thin plate of the rate of etching smaller than that of a reinforcing plate on one side of the reinforcing plate.
Inventors:
EDOKORO SOUTAROU
Application Number:
JP15238476A
Publication Date:
July 05, 1978
Filing Date:
December 17, 1976
Export Citation:
Assignee:
NIPPON ELECTRIC CO
International Classes:
C23C14/04; H01L21/285; (IPC1-7): C23C15/00; H01L21/28; H01L21/31