Title:
VAPORIZER, FILM DEPOSITION APPARATUS, CONCENTRATION CONTROL MECHANISM PROGRAM AND CONCENTRATION CONTROL METHOD
Document Type and Number:
Japanese Patent JP2020133001
Kind Code:
A
Abstract:
To provide a vaporizer controlling an overshoot of a material gas concentration just after starting a supply period.SOLUTION: A vaporizer includes a vaporization tank 10 for storing a material, a material gas outflow channel L2, a concentration monitor 40, and a concentration control mechanism 30 for controlling a concentration of the material gas outflowing from the material gas outflow channel, and repeats a supply and a stop of the material gas. The vaporizer includes a concentration calculation part C1 where the concentration control mechanism calculates a real concentration of the material gas based on an output signal from the concentration monitor, a concentration control part which performs a second control of a feedback control such that a real concentration approaches to a predetermined target value, after the first control is performed to control a control value of a liquid control device constituting the concentration control mechanism to be a predetermined initial set value, during a supply period of the material gas, and a control switch part for switching the concentration control part from the first control to the second control based on a change in a real concentration over time after the concentration control part starts the fist control.SELECTED DRAWING: Figure 1
Inventors:
SHIMIZU TORU
MINAMI MASAKAZU
MINAMI MASAKAZU
Application Number:
JP2020022006A
Publication Date:
August 31, 2020
Filing Date:
February 13, 2020
Export Citation:
Assignee:
HORIBA LTD
International Classes:
C23C16/448; G05B11/36; G05D21/00
Domestic Patent References:
| JP2018150572A | 2018-09-27 |
Attorney, Agent or Firm:
Ryuhei Nishimura
Saito Shindai
Uemura Yoshinaga
Saito Shindai
Uemura Yoshinaga