Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
VERTICAL DIFFUSION FURNACE
Document Type and Number:
Japanese Patent JP2008028014
Kind Code:
A
Abstract:

To uniformize the process gas supply amount supplied to each semiconductor substrate.

The semiconductor substrates 14 stored in a boat 13 are loaded in a process tube 11. An injector 18 is arranged in the process tube 11 so as to introduce a process gas into the process tube 11 through the injector 18. The injector 18 is arranged, in an attitude such that its vertically extended part is inclined with respect to the vertical direction, so that one end is close to the injector on the semiconductor substrate 14 side, where the process-gas supply amount is insufficient.


More Like This:
JP2011198968SUBSTRATE PROCESSING APPARATUS
JP2001176811WAFER SUPPORT DEVICE
JPS61178500CONVERSION OF LOCAL ATOMIC COMPOSITION OF SOLID BODY, MANUFACTURE OF SEMICONDUCTOR HAVING LOCALLY DIFFERENT ELECTROCONDUCTIVITIES, POLARIZATION OF SEMICONDUCTOR P-N JUNCTION, SEMICONDUCTOR-CONSTITUTIONAL ELEMENT, CONDENSATIONFOR MATTER AND GAS ACCUMULATOR
Inventors:
SUZUKI AYUMI
Application Number:
JP2006196747A
Publication Date:
February 07, 2008
Filing Date:
July 19, 2006
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
FUJIFILM CORP
International Classes:
H01L21/22; H01L21/324
Attorney, Agent or Firm:
Kazunori Kobayashi
Shigeru Iijima
Kobayashi Hideyoshi



 
Previous Patent: METHOD OF FORMING MICROPATTERN

Next Patent: CHIP-STACKED MULTI-CHIP PACKAGE, ITS ASSEMBLY METHOD, AND INSULATING FILM