Title:
VERTICAL OVEN AND METHOD OF PROCESSING SUBSTRATE
Document Type and Number:
Japanese Patent JP2002231635
Kind Code:
A
Abstract:
To enable a wafer as a processing object introduced in a vertical oven to be improved in the uniformity of a time integral value of temperature through its surface.
A boat loaded with wafers is introduced into a cylindrical oven, and the boat is so positioned as to make its rotation axis located away from the center axis of the cylindrical oven by a certain distance larger than the radius of the wafer and is rotated. The boat is not only rotated but is also revolved. Furthermore, the boat is moved vertically during processing.
Inventors:
NAKAGAWA YOSHIKAZU
Application Number:
JP2001021783A
Publication Date:
August 16, 2002
Filing Date:
January 30, 2001
Export Citation:
Assignee:
SEMICONDUCTOR LEADING EDGE TEC
International Classes:
F27D3/12; F27B5/06; H01L21/205; H01L21/22; H01L21/324; (IPC1-7): H01L21/205; F27B5/06; F27D3/12; H01L21/22; H01L21/324
Attorney, Agent or Firm:
Mamoru Takada (2 outside)
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