Title:
ビニルスルホン酸エステル誘導体、高分子化合物およびフォトレジスト組成物
Document Type and Number:
Japanese Patent JP5840146
Kind Code:
B2
Inventors:
Osamu Nakayama
Yoshinori Tani
Takashi Fukumoto
Akira Takeda Exhibition
Yoshinori Tani
Takashi Fukumoto
Akira Takeda Exhibition
Application Number:
JP2012553657A
Publication Date:
January 06, 2016
Filing Date:
January 10, 2012
Export Citation:
Assignee:
KURARAY CO.,LTD.
International Classes:
C07D307/00; C07D307/33; C07D327/04; C07D493/18; C07D497/18; C08F28/02; G03F7/039
Domestic Patent References:
| JP2004244436A | 2004-09-02 | |||
| JP2004145048A | 2004-05-20 | |||
| JP2003241385A | 2003-08-27 |
Foreign References:
| WO2003067332A2 | 2003-08-14 |
Other References:
JPN6015040401; ＩＩＭＯＲＩ，Ｈ． ｅｔ ａｌ: 'Ａ ｎｅｗ ｐｈｏｔｏｒｅｓｉｓｔ ｍａｔｅｒｉａｌｓ ｆｏｒ １５７ ｎｍｌｉｔｈｏｇｒａｐｈｙ-３： Ｐｏｌｙ［２-ｈｙｄｒｏｘｙ-３-ｐｉｎａｎｙｌ ｖｉｎｙｌ ｓｕｌｆｏｎａｔｅｃｏ-４-（１' Ｊｏｕｒｎａｌ ｏｆ Ｐｈｏｔｏｐｏｌｙｍｅｒ Ｓｃｉｅｎｃｅ ａｎｄ Ｔｅｃｈｎｏｌｏｇｙ Ｖｏｌ．１６，Ｎｏ．４, 2003, ｐ．６０１-６０５