Title:
WAFER CLEANING APPARATUS
Document Type and Number:
Japanese Patent JP3209403
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a wafer cleaning apparatus by which a wafer can be cleaned effectively in one cleaning tank.
SOLUTION: Wafers W which are housed inside a cleaning tank 14 are cleaned in such a way that a cleaning liquid is jetted from a plurality of nozzles 20A which are arranged and installed inside the cleaning tank 14. At this time, since the nozzles 20A are moved back and forth in the direction of the axial line of every wafer W, the cleaning liquid which is jetted from the nozzles 20A is supplied over the whole face of every wafer so as to be cleaned uniformly. In addition, the cleaning liquid which is jetted from the nozzles creeps effectively into the gap in every wafer W, and the wafers W can be internally cleaned sufficiently.
Inventors:
Satoru Minami
Kenichi Nakaura
Kenichi Nakaura
Application Number:
JP34390396A
Publication Date:
September 17, 2001
Filing Date:
December 24, 1996
Export Citation:
Assignee:
Tokyo Seimitsu Co., Ltd.
International Classes:
B08B3/02; B08B3/12; H01L21/304; (IPC1-7): H01L21/304; B08B3/02; B08B3/12
Domestic Patent References:
| JP645297A | ||||
| JP5109684A |
Attorney, Agent or Firm:
Kenzo Matsuura