Title:
WAFER DRYING DEVICE
Document Type and Number:
Japanese Patent JP2604561
Kind Code:
B2
Abstract:
PURPOSE: To efficiently exhaust dust originated from a balancer mechanism so as to prevent it from adhering again to a wafer for enabling a wafer drying device to operate for a long term.
CONSTITUTION: A shielding plate 1 which is possessed of a pumping function to suck in air from a drying chamber 5a screening the drying chamber 5a from a movable balancer mechanism 3 so as not to make the balancer mechanism exposed to the drying chamber 5a and a partitioning plate 12 which prevents air which contains moisture and dust sucked in from the drying chamber 5a from penetrating into the balancer mechanism 3 are provided.
Inventors:
Masayoshi Kasahara
Application Number:
JP32266394A
Publication Date:
April 30, 1997
Filing Date:
December 26, 1994
Export Citation:
Assignee:
Yamagata NEC Corporation
International Classes:
F26B5/08; F26B11/08; H01L21/00; H01L21/304; (IPC1-7): H01L21/304; F26B5/08; F26B11/08
Attorney, Agent or Firm:
Naoki Kyomoto (2 outside)