Title:
WAFER HOLDING MECHANISM IN ROTARY DRYING DEVICE
Document Type and Number:
Japanese Patent JP3550385
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a wafer holding mechanism in a rotary drying device having a small number of components and a simple structure.
SOLUTION: The wafer holding mechanism comprises a holding arm 32 and a lock pin 38. The holding arm 32 is installed such that it can rotate around one end thereof with respect to a rotor 16, and has a movably holding member 20 which is attached at the other end thereof, and the holding arm 32, when it is turned around one end thereof, causes the movably holding member 20 to turn for displacement between a holding status and a detaching status. The lock pin 38 is formed in an inverted L, is placed so as to be able to swing around one end thereof with respect to the rotor 16, and is energized by an energizing means such that the inner part of a buttock portion of the inverted L abuts on the movably holding member 20 which is in the holding status. In the wafer holding mechanism configured as above, the lock pin 38, when the rotor 16 is in a stationary status, does not prevent the motion of the movably holding member 20 from being shifted from the holding status to a detaching status, and, when the rotor is in a rotation status, the inner part of the buttock portion of the inverted L presses and engages the movably holding member 20 by the inertia force thereof to prevent the movably holding member 20 from turning from the holding status to the detaching status.
Inventors:
Teruo Kozai
Sakae Katsumura
Kenichi Yano
Sakae Katsumura
Kenichi Yano
Application Number:
JP2001329562A
Publication Date:
August 04, 2004
Filing Date:
October 26, 2001
Export Citation:
Assignee:
Kokusan Co., Ltd.
International Classes:
F26B5/08; H01L21/304; H01L21/306; H01L21/68; H01L21/683; (IPC1-7): H01L21/304; F26B5/08; H01L21/306; H01L21/68
Domestic Patent References:
| JP11214348A |
Attorney, Agent or Firm:
Toshio Umeda
Kazuya Chikatsu
Kazuya Chikatsu