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Title:
WAFER PROCESSING APPARATUS
Document Type and Number:
Japanese Patent JP2009095953
Kind Code:
A
Abstract:

To provide a wafer processing apparatus reducing a working labor involved in reducing the number of components and suppressing increase of a cost, by providing a vacuum chuck suction mechanism compatible with dicing frames of a plurality of sizes.

A plurality of frame holding parts 30 are disposed around a vacuum chuck type chuck table 21 on which a wafer 1 is placed. The frame holding part 30 includes: a movable piece 32 having a suction pad 33 for sucking and holding a dicing frame 6; and a guide rod 31 for movably supporting the movable piece 32 along a radial direction of the chuck table 21. The movable piece 32 is moved according to a diameter of the held dicing frame 6, and locked by a lock mechanism, and the dicing frame 6 is sucked and held in this position.


Inventors:
NOMURA HIROSHI
Application Number:
JP2007271474A
Publication Date:
May 07, 2009
Filing Date:
October 18, 2007
Export Citation:
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Assignee:
DISCO ABRASIVE SYSTEMS LTD
International Classes:
B23K26/10; B23K26/38; B23K26/40; B24B41/06; H01L21/301; H01L21/683; B23K101/40
Domestic Patent References:
JP2006281434A2006-10-19
JP3075654U2001-02-27
JP2007229889A2007-09-13
JP2007142220A2007-06-07
Attorney, Agent or Firm:
Suenari Mikio



 
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