Title:
ウェハ
Document Type and Number:
Japanese Patent JP6902571
Kind Code:
B2
Abstract:
To provide a wafer with which it is possible to obtain a plurality of Fabry-Perot interference filters efficiently with good yield.SOLUTION: The wafer comprises a substrate layer, a first mirror layer having a plurality of two-dimensionally arranged mirror parts, and a second mirror layer having a plurality of two-dimensionally arranged mirror parts. In an effective area, a plurality of Fabry-Perot interference filter parts are constituted due to the fact that a space is formed between the first and the second mirror parts facing each other. In a dummy area along the outer edge of the substrate layer and enclosing the effective area, a plurality of dummy filter parts are constituted due to the fact that an intermediate layer is provided between the first and the second mirror parts facing each other. In a boundary between the effective area and the dummy area, a groove that is opened on the opposite side to the substrate layer extends along the boundary.SELECTED DRAWING: Figure 7
Inventors:
Toshimitsu Kawai
Katsumi Shibayama
Takashi Kasahara
Hirose Maki
Yasuo Oyama
Kuramoto
Katsumi Shibayama
Takashi Kasahara
Hirose Maki
Yasuo Oyama
Kuramoto
Application Number:
JP2019088308A
Publication Date:
July 14, 2021
Filing Date:
May 08, 2019
Export Citation:
Assignee:
Hamamatsu Photonics Co., Ltd.
International Classes:
G02B26/00; B81B3/00
Domestic Patent References:
| JP2004069733A | ||||
| JP2003131024A | ||||
| JP2016211860A | ||||
| JP2012209635A |
Foreign References:
| WO2016176735A1 |
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshiki Kuroki
Kenichi Shibayama
Yoshiki Kuroki
Kenichi Shibayama