Title:
WASHING BRUSH, AND UNIT AND METHOD TO USE THE BRUSH
Document Type and Number:
Japanese Patent JP2003000349
Kind Code:
A
Abstract:
To improve the production yield of liquid crystal boards and semiconductor boards by reducing foreign matters and scratches generated by brush washing to decrease device defects such as breakages and short circuits of wiring.
Bristle points of a brush are treated by a solvent or heating. Thus foreign matters and scratches generated on a board by brush washing can be reduced.
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Inventors:
OSAWA TOSHIYUKI
TAKAHARA YOICHI
TAKAHARA YOICHI
Application Number:
JP2001190589A
Publication Date:
January 07, 2003
Filing Date:
June 25, 2001
Export Citation:
Assignee:
HITACHI LTD
International Classes:
A46D1/00; A46D1/05; B08B3/02; H01L21/304; B08B1/04; (IPC1-7): A46D1/05; A46D1/00; B08B1/04; B08B3/02; H01L21/304
Attorney, Agent or Firm:
Sakuta Yasuo