To provide a waste gas treatment and a waste gas treatment method.
In the waste gas treatment device, a waste gas pre-treatment device for treating the waste gas discharged from a semiconductor (or LCD) manufacturing facility by a wet treatment system is constituted to prolong the life of the waste gas treatment device and a moisture removal device for removing the moisture contained in the gas finally treated is constituted to prevent dew condensation from being generated in an exhaust duct. Further, a shielding unit is constituted at the inside of a heating chamber for burning the waste gas to prevent the inside of the heating chamber from being corroded by fluorine based gas and it is solved that a particulate is agglomerated by improving a cooling structure for cooling a lower part of the heating chamber. The time when the waste gas is stayed at the inside of the heating chamber is lengthened by improving a feed structure of the waste gas fed to the heating chamber.
| JP2574603 | [Name of device] Air purifier |
| JPS5715818 | EQUIPMENT FOR GAS-LIQUID CONTACT |
JUNG SUNG JIN
LEE MAN SU
JEONG CHANG WOOK
LEE GEUN SIK
Tadashi Takahashi
Takashi Watanabe
Masakazu Aoyama
Suzuki Mitsuyoshi
Kazuya Nishi
Yasuhiko Murayama
Shinya Mitsuhiro
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