Title:
WASTE LIQUID TREATMENT APPARATUS
Document Type and Number:
Japanese Patent JP2020054957
Kind Code:
A
Abstract:
To provide a waste liquid treatment apparatus which facilitates work for pulling out an anode plate from a liquid tank or inserting the anode plate into the liquid tank, without being disturbed by silicon chips.SOLUTION: A waste liquid treatment apparatus 1 which separates treated waste liquid mixed-in with silicon chips into silicon chips and fresh water, comprises: a liquid tank 2 that stores treated waste liquid L; cathode plates 30 arranged at equal intervals in the liquid tank 2 and charged in minus; anode plates 31 separated at a predetermined interval from the cathode plates 30 to oppose to the cathode plates 30, arranged in the liquid tank 2 to be insertably and drawably and charged in plus; drawing/inserting means 32 that holds upper parts of the anode plates 31 and draws out the anode plates 31 from the liquid tank 2 or inserts the plates into the liquid tank 2; and interval formation parts 309 protruding from at least both surfaces of the cathode plates 30 in order for the cathode plates 30 and the anode plates 31 to form prescribed intervals in the liquid tank 2.SELECTED DRAWING: Figure 4
Inventors:
MASE YUSUKE
Application Number:
JP2018187348A
Publication Date:
April 09, 2020
Filing Date:
October 02, 2018
Export Citation:
Assignee:
DISCO ABRASIVE SYSTEMS LTD
International Classes:
B03C5/02
Domestic Patent References:
| JP2014124576A | 2014-07-07 | |||
| JPH0871449A | 1996-03-19 | |||
| JPH0857348A | 1996-03-05 |
Attorney, Agent or Firm:
Patent Business Corporation Tokyo Alpa Patent Office