WET HONING TREATMENT METHOD, BASE MATERIAL FOR ELECTROPHOTOGRAPHIC PHOTORECEPTOR, ELECTROPHOTOGRAPHIC PHOTORECEPTOR, AND ITS MANUFACTURING METHOD

Title:

WET HONING TREATMENT METHOD, BASE MATERIAL FOR ELECTROPHOTOGRAPHIC PHOTORECEPTOR, ELECTROPHOTOGRAPHIC PHOTORECEPTOR, AND ITS MANUFACTURING METHOD

Document Type and Number:

Japanese Patent JP2005037710

Kind Code:

A

Abstract:

To provide a wet honing method capable of suppressing the generation of the aggregate of an abrasive material due to the scale in a polishing liquid and sufficiently suppressing the occurrence of depression defects and honing flaws to be the cause for a coating film defect.

The wet honing treatment method has a process of preparing the polishing liquid 100 which contains the abrasive material and a dispersion medium to disperse the abrasive material and is below viable count 50 colonies/cm3, a process of preparing a conductive base material 1 used for an electrophotographic photoreceptor, and a process of polishing the surface of the base material by using the polishing liquid 100.

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Inventors:

NISHIKAWA KYOKO
HORII NORITAKA
AZUMA MASARU
NAKABAYASHI WATARU
SEKO MASAMICHI
HONGO KAZUYA

Application Number:

JP2003274825A

Publication Date:

February 10, 2005

Filing Date:

July 15, 2003

Export Citation:

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Assignee:

FUJI XEROX CO LTD

International Classes:

G03G5/00; G03G5/10; (IPC1-7): G03G5/00; G03G5/10

Attorney, Agent or Firm:

Yoshiki Hasegawa
Masatoshi Shibata

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