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Title:
WINDOW FOR ADMITTING PASSAGE OF ELECTRON BEAMS AND MANUFACTURING METHOD FOR WINDOW
Document Type and Number:
Japanese Patent JP2002197973
Kind Code:
A
Abstract:

To manufacture a window to admit passage of an electron beam and offer a window to admit passage of electron beam.

The window to admit passage of electron beam includes a foil (1; 101) to admit passage of electron beam and an element (2; 102) to support the peripheral regions (1a and 1b) of the foil in the operating condition, wherein the element is made of a material having a greater coefficient of linear thermal expansion than the foil material and has further intermediate layers (4; 104a and 104b), and the intermediate layers are arranged between the foil (1; 101) and the holding element (2; 102) to function as supporting element and are made of a material having a coefficient of linear thermal expansion equal to or near that of the foil material and smaller than that of the holding element concerning the range of the treatment temperature. The invention concerns also to a method to manufacture such a window and an X-ray device equipped therewith.


Inventors:
BACHMANN PETER KLAUS
BECKMANN MANFRED
FLISIKOWSKI PETER
HARDING GEOFFREY
Application Number:
JP2001314495A
Publication Date:
July 12, 2002
Filing Date:
October 11, 2001
Export Citation:
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Assignee:
KONINKL PHILIPS ELECTRONICS NV
International Classes:
B81B3/00; G01T7/00; H01J9/02; H01J9/24; H01J33/04; H01J35/08; G21K5/08; H01J35/16; (IPC1-7): H01J9/24; G01T7/00; G21K5/08; H01J9/02; H01J35/08; H01J35/16
Attorney, Agent or Firm:
Tadahiko Ito