To provide a wire grid polarizer where the thickness of a metal filament in the traveling direction of light is large, and a method of manufacturing the wire grid polarizer for easily preparing the wire grid polarizer and preparing the polarizer even when its size exceeds a wafer size.
A plurality of narrow and linear projecting parts 2 are formed on the surface of an optically transparent support body 1 so that they are arranged in parallel with each other at a constant pitch P. Upper metal layers 4 are formed on the top surfaces of the projecting parts 2, side metal layers 5 are formed on the whole side surfaces and sides of the projecting parts 2 while being connected to the upper metal layers 4, and a metal filament 6 is constituted by each upper metal layer 4 and each side metal layer 5. The upper metal layers 4 and the side metal layers 5 are formed by depositing a metal material from an oblique direction by a vapor deposition method or a sputtering method, for example.
SHIMODA KAZUTO
KASEGAWA AKIRA
Hiroshi Osaka
Osamu Matsumura
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