To provide a wiring board in which a proper substrate strength can be obtained and a feed-through electrode can be formed in a through-hole of a substrate with a high yield and production efficiency.
The wiring board includes a first substrate portion 5a formed from a wafer and including a first feed-through conductor portion 20 in a vertical direction, a second substrate portion 5b provided on the first substrate portion 5a and including a second feed-through conductor portion 40 in a vertical direction of a corresponding part to the first feed-through conductor portion 20, and the feed-through electrode TE is composed of the first feed-through conductor portion 20 and the second feed-through conductor portion 40. Substrates 10 and 30 of the first substrate portion 5a and second substrate portion 5b are made of silicon, silicon carbide or glass.
SHIRAISHI AKINORI
HIGASHI MITSUTOSHI
JP2008130934A | 2008-06-05 | |||
JP2006344725A | 2006-12-21 | |||
JP2004319758A | 2004-11-11 | |||
JP2008130934A | 2008-06-05 | |||
JP2006344725A | 2006-12-21 | |||
JP2004319758A | 2004-11-11 |
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