Title:
X-RAY PHOTOELECTRON SPECTROSCOPE
Document Type and Number:
Japanese Patent JP3163201
Kind Code:
B2
Abstract:
PURPOSE: To achieve charge compensation without affecting other parts which are not charged up when locally charging up a sample generated on measurement by providing aa variable resistor between a sample and the ground.
CONSTITUTION: An Si fine particle (sample) 2 is introduced to a vacuum chamber 7 via a preliminary exhaust chamber 9 and is mounted to a sample stand 3 for continuity. The resistance of a variable resistor 4 is set to approximately 0 ohms, X rays are applied to the sample 2 by an X-ray source 1, and then Si-2p photoelectron spectrum is measured by a computer 14. Then, the resistance of the resistor 4 is set to several 100 Kohms an measurement is made similarly. Further, the resistance of the resistor 4 is increased for measurement. As the resistance of the resistor 4 increases, pseudo spectrum appearing at the bottom of a high-energy side of a spectrum indicating SiO2 near a combination energy near approximately 104eV decreases and then nearly disappears at a resistance of for example 1 Mohms since the potential of the entire sample 2 is brought closer to uniformly by the resistor 4, thus solving the problem of pseudo spectrum and that of a broad peak.
Inventors:
Shigeki Yoshida
Application Number:
JP13248193A
Publication Date:
May 08, 2001
Filing Date:
May 11, 1993
Export Citation:
Assignee:
Canon Inc
International Classes:
G01N23/227; (IPC1-7): G01N23/227
Domestic Patent References:
| JP3221853A | ||||
| JP61294748A |
Attorney, Agent or Firm:
Katsuhiro Yoshida (1 person outside)
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